Patterning of material layers in submicron region

Title
  1. Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Published by
  1. New York : J. Wiley, 1993.
Author
  1. Tandon, U. S., 1952-

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Details

Additional authors
  1. Khokle, W. S.
Description
  1. xii, 183 p. : ill. (some col.); 25 cm.
Subject
  1. Ion beam lithography
  2. X-ray lithography
  3. Integrated circuits > Masks
  4. Lithography, Electron beam
Call number
  1. JSF 95-175
Bibliography (note)
  1. Includes bibliographical references and index.
Author
  1. Tandon, U. S., 1952-
Title
  1. Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Imprint
  1. New York : J. Wiley, 1993.
Bibliography
  1. Includes bibliographical references and index.
Added author
  1. Khokle, W. S.
LCCN
  1. 92036072
ISBN
  1. 0470220635 (J. Wiley)
  2. 8122405614 (Wiley Eastern)
Research call number
  1. JSF 95-175
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