Preferentially etched epitaxial liftoff of InP material

Title
  1. Preferentially etched epitaxial liftoff of InP material [microform] / inventor (s), Sheila G. Bailey, David M. Wilt, Frank L. DeAngelo.
Published by
  1. [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1995]

Details

Additional authors
  1. Bailey, Sheila G.
  2. Wilt, David M.
  3. DeAngelo, Frank L.
  4. United States. National Aeronautics and Space Administration.
Description
  1. 1 v.
Series statement
  1. NASA case ; no. LEW-15, 760-1
Uniform title
  1. NASA case ; LEW-15760-1.
Subject
  1. Epitaxy
  2. Etching
  3. Indium phosphides
  4. Removal
  5. Substrates
Call number
  1. READEX Microfiche NAS 1.71:LEW-15760-1
Note
  1. Distributed to depository libraries in microfiche.
  2. Shipping list no.: 95-0748-M.
Reproduction (note)
  1. Microfiche.
Title
  1. Preferentially etched epitaxial liftoff of InP material [microform] / inventor (s), Sheila G. Bailey, David M. Wilt, Frank L. DeAngelo.
Imprint
  1. [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1995]
Series
  1. NASA case ; no. LEW-15, 760-1
  2. NASA case ; LEW-15760-1.
Reproduction
  1. Microfiche. [Washington, D.C. : National Aeronautics and Space Administration, 1995] 1 microfiche.
Added author
  1. Bailey, Sheila G.
  2. Wilt, David M.
  3. DeAngelo, Frank L.
  4. United States. National Aeronautics and Space Administration.
Gpo item no.
  1. 0830-J-10 (MF)
Sudoc no.
  1. NAS 1.71:LEW-15760-1
Research call number
  1. READEX Microfiche NAS 1.71:LEW-15760-1
View in legacy catalog