Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP
Title
Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP [microform] / Dragan M. Pantic ... [et al.] ; presented at the Dielectric Films on Compound Semiconductors Symposium sponsored by the Electrochemical Society, Honolulu, Hawaii, October 18-23, 1987.
Published by
[Washington, D.C.] : NASA ; Springfield, Va. : For sale by the National Technical Information Service, [1990]
Also available via Internet from the NASA Technical Report Server web site. Address as of 5/9/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011077%5F1990011077.pdf ; current access is available via PURL.
Reproduction (note)
Microfiche.
Title
Electron beam induced damage in PECVD Si₃N₄ and SiO₂ films on InP [microform] / Dragan M. Pantic ... [et al.] ; presented at the Dielectric Films on Compound Semiconductors Symposium sponsored by the Electrochemical Society, Honolulu, Hawaii, October 18-23, 1987.
Imprint
[Washington, D.C.] : NASA ; Springfield, Va. : For sale by the National Technical Information Service, [1990]
Series
NASA technical memorandum ; 102544
Bibliography
Includes bibliographical references (p. 13).
Additional formats
Also available via Internet from the NASA Technical Report Server web site. Address as of 5/9/06: http://ntrs.nasa.gov/archive/nasa/casi.ntrs.nasa.gov/19900011077%5F1990011077.pdf ; current access is available via PURL.
Reproduction
Microfiche. [Washington, D.C. : National Aeronautics and Space Administration], 1990. 1 microfiche : negative.