Research Catalog

Details

Additional authors

1. Avni, Reuven.
2. United States. National Aeronautics and Space Administration.

Description

1. 1 v.

Series statement

1. NASA technical memorandum ; 83603

Subject

1. Radio frequencies
2. Precipitation (chemistry)
3. Plasma heating
4. Electrostatics
5. Chlorosilanes
6. Hydrogen plasmas
7. Argon plasmas

Call number

1. GPO Microfiche NAS 1.15:83603

Reproduction (note)

1. Microfiche.

Title

1. Correlation between plasma variables and the deposition process of Si films from chlorosilanes in low pressure rf plamas of argon and hydrogen [microform] / R. Avni, ... [et al.].

Imprint

1. [Washington, D.C. : National Aeronautics and Space Administration, 1984]

Series

1. NASA technical memorandum ; 83603

Reproduction

1. Microfiche. [Washington, D.C. : National Aeronautics and Space Administration], 1984. 1 microfiche.

Added author

1. Avni, Reuven.
2. United States. National Aeronautics and Space Administration.

Gpo item no.

1. 0830-D (MF)

Sudoc no.

1. NAS 1.15:83603

Research call number

1. GPO Microfiche NAS 1.15:83603