Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash., USA : SPIE, [1991], ©1991.

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Details

Additional authors
  1. Peckerar, Martin Charles, 1946-
  2. Society of Photo-optical Instrumentation Engineers.
  3. SPIE Symposium on Microlithography (1991 : San Jose, Calif.)
Description
  1. x, 340 pages : illustrations; 28 cm.
Series statement
  1. SPIE proceedings series, 0277-786X ; vol. 1465
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1465.
Subject
  1. Ion beam lithography > Congresses
  2. X-ray lithography > Congresses
  3. Lithography, Electron beam > Congresses
Owning institution
  1. Columbia University Libraries
Note
  1. "Conference 1465 ... was part of a two-conference program on Lithography Engineering, held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii.
Bibliography (note)
  1. Includes bibliographical references and index.