Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash., USA : SPIE, [1992], ©1992.

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Details

Additional authors
  1. Peckerar, Martin Charles, 1946-
  2. Society of Photo-optical Instrumentation Engineers.
Description
  1. x, 488 pages : illustrations; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering ; v. 1671
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1671.
Subject
  1. X-ray lithography > Congresses
  2. Ion beam lithography > Congresses
  3. Lithography, Electron beam > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and author index.