Modeling of chemical vapor deposition of tungsten films
- Title
- Modeling of chemical vapor deposition of tungsten films / Chris R. Kleijn, Christoph Werner.
- Published by
- Basel ; Boston : Birkhäuser Verlag, 1993.
- Author
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7871.15.F5 K53 1993 | Item locationOff-site |
Details
- Additional authors
- Description
- 138 pages : illustrations; 23 cm.
- Series statement
- Progress in numerical simulation for microelectronics ; vol. 2
- Uniform title
- Progress in numerical simulation for microelectronics ; v. 2.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographical references.