Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash. : The Society, [1993], ©1993.

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Details

Additional authors
  1. Patterson, David O.
  2. Society of Photo-optical Instrumentation Engineers.
Description
  1. vii, 470 pages : illustrations; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering ; v. 1924
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1924.
Subject
  1. Masks (Electronics) > Congresses
  2. X-ray lithography > Congresses
  3. Lithography, Electron beam > Congresses
  4. Ion beam lithography > Congresses
  5. Semiconductors > Etching > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.