Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Published by
  1. Bellingham, Wash., USA : SPIE, [1994], ©1994.

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Details

Additional authors
  1. Patterson, David O.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
Description
  1. vii, 420 pages : illustrations; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering ; v. 2194
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.
Subject
  1. Lithography, Electron beam > Congresses
  2. Ion beam lithography > Congresses
  3. Masks (Electronics) > Congresses
  4. Semiconductors > Etching > Congresses
  5. X-ray lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.