Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
- Published by
- Bellingham, Wash., USA : SPIE, [1994], ©1994.
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Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E4834 1994g | Item locationOff-site |
Details
- Additional authors
- Description
- vii, 420 pages : illustrations; 28 cm.
- Series statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 2194
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographical references and index.