Kinetics and characterization of tungsten CVD processes
- Title
- Kinetics and characterization of tungsten CVD processes / door Johannes Andreas Maria Ammerlaan.
- Published by
- Delft : Delft University Press, [1994], ©1994.
- Author
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Displaying 1 item
| Status | Format | Access | Call number | Item location |
|---|---|---|---|---|
| Status | FormatText | AccessRequest in advance | Call numberTS695 .A46 1994g | Item locationOff-site |
Details
- Description
- 172 pages : illustrations; 24 cm
- Subject
- Contents
- Ch. 1. Introduction -- Ch. 2. Experimental Setups in Studies of Tungsten CVD -- Ch. 3. Kinetics of Tungsten LPCVD by H[subscript 2] Reduction of WF[subscript 6] -- Ch. 4. Kinetics and Mechanism of Tungsten LPCVD Using WF[subscript 6] and SiH[subscript 4] -- Ch. 5. Deposition of Tungsten by H[subscript 2] Reduction of WCl[subscript 6] -- Ch. 6. Deposition of Tungsten and Molybdenum Using Hexacarbonyl Precursors -- Ch. 7. General Conclusions and Recommendations.
- Owning institution
- Columbia University Libraries
- Note
- Summary, postscript and vita in Dutch.
- Thesis (note)
- Thesis (doctoral)--Technische Universteit Delft, 1994.
- Bibliography (note)
- Includes bibliographical references.