Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California

Title
  1. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Published by
  1. Bellingham, Wash., USA : SPIE, [1995], ©1995.

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Details

Additional authors
  1. Warlaumont, John M.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
Description
  1. vii, 450 pages : illustrations; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering ; v. 2437
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 2437.
Subject
  1. X-ray lithography > Congresses
  2. Ion beam lithography > Congresses
  3. Integrated circuits > Masks > Congresses
  4. Lithography, Electron beam > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.