Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California
- Title
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Published by
- Bellingham, Wash. : SPIE, [1996], ©1996.
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Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E44 1996g | Item locationOff-site |
Details
- Additional authors
- Description
- vii, 412 pages : illustrations; 28 cm.
- Series statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 2723
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographic references and index.