Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California

Title
  1. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Published by
  1. Bellingham, Wash. : SPIE, [1996], ©1996.

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Details

Additional authors
  1. Seeger, David E.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
  4. SEMATECH (Organization)
Description
  1. vii, 412 pages : illustrations; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering ; v. 2723
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
Subject
  1. Lithography, Electron beam > Congresses
  2. Integrated circuits > Masks > Congresses
  3. Ion beam lithography > Congresses
  4. X-ray lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographic references and index.