Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California

Title
  1. Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
Published by
  1. Bellingham, Wash., USA : SPIE, [1997], ©1997.

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Details

Additional authors
  1. Seeger, David E.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
  4. SEMATECH (Organization)
Description
  1. ix, 412 pages : illustrations; 28 cm.
Series statement
  1. SPIE proceedings series ; v. 3048
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3048.
Subject
  1. Lithography, Electron beam > Congresses
  2. X-ray lithography > Congresses
  3. Masks (Electronics) > Congresses
  4. X-rays > Industrial applications > Congresses
  5. Electron beams > Industrial applications > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.