Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- Title
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Published by
- Bellingham, Wash. : SPIE, [1998], ©1998.
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E523 1998g | Item locationOff-site |
Details
- Additional authors
- Description
- xiii, 702 pages : illustrations; 28 cm.
- Series statement
- Proceedings of SPIE, 0277-786X ; v. 3331
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 3331.
- Alternative title
- Emerging lithographic technologies 2
- Emerging lithographic technologies two
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographical references and index.