Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

Title
  1. Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Published by
  1. Bellingham, Wash. : SPIE, [1998], ©1998.

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Details

Additional authors
  1. Vladimirsky, Yuli.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
  4. SEMATECH (Organization)
Description
  1. xiii, 702 pages : illustrations; 28 cm.
Series statement
  1. Proceedings of SPIE, 0277-786X ; v. 3331
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3331.
Alternative title
  1. Emerging lithographic technologies 2
  2. Emerging lithographic technologies two
Subject
  1. Masks (Electronics) > Congresses
  2. Lithography, Electron beam > Congresses
  3. X-ray lithography > Congresses
  4. X-rays > Industrial applications > Congresses
  5. Microlithography > Industrial applications > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.