Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California

Title
  1. Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Published by
  1. Bellingham, Washington : SPIE, [1999], ©1999.

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Details

Additional authors
  1. Vladimirsky, Yuli.
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
Description
  1. 2 volumes (xvii, 864 pages) : illustrations; 28 cm.
Series statement
  1. Proceedings of SPIE ; v. 3676
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3676.
Subject
  1. Masks (Electronics) > Congresses
  2. Microlithography > Industrial applications > Congresses
  3. Lithography, Electron beam > Congresses
  4. X-rays > Industrial applications > Congresses
  5. X-ray lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and author index.