Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA
- Title
- Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
- Published by
- Bellingham, Washington : SPIE, [2000], ©2000.
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E523 2000g | Item locationOff-site |
Details
- Additional authors
- Description
- xv, 900 pages : illustrations; 28 cm.
- Series statement
- Proceedings of SPIE ; v. 3997
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 3997.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographic references and author index.