Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA

Title
  1. Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Published by
  1. Bellingham, Washington : SPIE, [2000], ©2000.

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Details

Additional authors
  1. Dobisz, Elizabeth A. (Elizabeth Ann)
  2. Society of Photo-optical Instrumentation Engineers.
  3. Semiconductor Equipment and Materials International.
  4. International SEMATECH.
Description
  1. xv, 900 pages : illustrations; 28 cm.
Series statement
  1. Proceedings of SPIE ; v. 3997
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3997.
Subject
  1. Lithography, Electron beam > Congresses
  2. Masks (Electronics) > Congresses
  3. X-ray lithography > Congresses
  4. X-rays > Industrial applications > Congresses
  5. Microlithography > Industrial applications > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographic references and author index.