Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Title
- Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
- Published by
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
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Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessUse in library | Call numberTK7874 .E43 | Item locationOff-site |
Details
- Additional authors
- Description
- vi, 272 p. : ill.; 28 cm.
- Series statement
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 632
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 632.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographies and index.