Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.

Title
  1. Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
Published by
  1. Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.

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Details

Additional authors
  1. Blais, Phillip D.
Description
  1. vi, 272 p. : ill.; 28 cm.
Series statement
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 632
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 632.
Subject
  1. Microlithography > Congresses
  2. Ion beam lithography > Congresses
  3. Lithography, Electron beam > Congresses
  4. X-ray lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographies and index.