Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA

Title
  1. Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Published by
  1. Bellingham, Wash. : SPIE, c2003.

Items in the library and off-site

Filter by

Displaying all 2 items

StatusVol/dateFormatAccessCall numberItem location
StatusVol/datept.2FormatTextAccessUse in libraryCall numberTK7874 .E523 2003g pt.2Item locationOff-site
StatusVol/datept.1FormatTextAccessUse in libraryCall numberTK7874 .E523 2003g pt.1Item locationOff-site

Details

Additional authors
  1. Engelstad, Roxann L.
  2. Society of Photo-optical Instrumentation Engineers
  3. Semiconductor Equipment and Materials International
  4. International SEMATECH.
Description
  1. 2 v. : ill.; 28 cm.
Series statement
  1. Proceedings of SPIE ; v. 5037
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 5037.
Subject
  1. X-ray lithography > Congresses
  2. Masks (Electronics) > Congresses
  3. X-rays > Industrial applications > Congresses
  4. Lithography, Electron beam > Congresses
  5. Microlithography > Industrial applications > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and author index.