Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Title
- Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
- Published by
- Bellingham, Wash., USA : SPIE, c2004.
Items in the library and off-site
Displaying all 2 items
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessUse in library | Call numberTK7874 .E523 2004g pt.1 | Item locationOff-site |
Status | FormatText | AccessUse in library | Call numberTK7874 .E523 2004g pt.2 | Item locationOff-site |
Details
- Additional authors
- Description
- 2 v. (xxxviii, 1110 p.) : ill.; 28 cm.
- Series statement
- Proceedings of SPIE, 0277-786X ; v. 5374
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 5374.
- Alternative title
- Emerging lithographic technologies 8
- Emerging lithographic technologies eight
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographical references and index.