Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.

Title
  1. Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
Published by
  1. Bellingham, Wash., USA : SPIE, c2004.

Items in the library and off-site

Filter by

Displaying all 2 items

StatusFormatAccessCall numberItem location
StatusFormatTextAccessUse in libraryCall numberTK7874 .E523 2004g pt.1Item locationOff-site
StatusFormatTextAccessUse in libraryCall numberTK7874 .E523 2004g pt.2Item locationOff-site

Details

Additional authors
  1. International SEMATECH.
  2. Mackay, R. Scott.
  3. Semiconductor Equipment and Materials International.
  4. Society of Photo-optical Instrumentation Engineers.
Description
  1. 2 v. (xxxviii, 1110 p.) : ill.; 28 cm.
Series statement
  1. Proceedings of SPIE, 0277-786X ; v. 5374
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 5374.
Alternative title
  1. Emerging lithographic technologies 8
  2. Emerging lithographic technologies eight
Subject
  1. Lithography, Electron beam > Congresses
  2. Microlithography > Industrial applications > Congresses
  3. X-ray lithography > Congresses
  4. Masks (Electronics) > Congresses
  5. X-rays > Industrial applications > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographical references and index.