Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California

Title
  1. Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash., USA : The Society, [1988], ©1988.

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Details

Additional authors
  1. Yanof, Arnold W.
  2. Society of Photo-optical Instrumentation Engineers.
Description
  1. vi, 307 pages : illustrations; 28 cm.
Series statement
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 923
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 923.
Subject
  1. Lithography, Electron beam > Congresses
  2. Ion beam lithography > Congresses
  3. X-ray lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographies and index.