Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash., USA : The Society, [1989], ©1989.

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Details

Additional authors
  1. Yanof, Arnold W.
  2. Society of Photo-optical Instrumentation Engineers.
Description
  1. viii, 388 pages : illustrations; 28 cm.
Series statement
  1. Proceedings ; v. 1089
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1089.
Subject
  1. X-ray lithography > Congresses
  2. Lithography, Electron beam > Congresses
  3. Ion beam lithography > Congresses
Owning institution
  1. Columbia University Libraries
Bibliography (note)
  1. Includes bibliographies and index.