Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
- Published by
- Bellingham, Wash., USA : The Society, [1989], ©1989.
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E4355 1989g | Item locationOff-site |
Details
- Additional authors
- Description
- viii, 388 pages : illustrations; 28 cm.
- Series statement
- Proceedings ; v. 1089
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1089.
- Subject
- Owning institution
- Columbia University Libraries
- Bibliography (note)
- Includes bibliographies and index.