Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Published by
- Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessRequest in advance | Call numberTK7874 .E4356 1990g | Item locationOff-site |
Details
- Additional authors
- Description
- viii, 344 pages : illustrations; 28 cm.
- Series statement
- Proceedings / SPIE--the International Society for Optical Engineering ; v. 1263
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
- Alternative title
- Submicrometer lithographies nine.
- Subject
- Owning institution
- Columbia University Libraries
- Note
- Includes index.
- Bibliography (note)
- Includes bibliographical references.