Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California /
- Title
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
- Published by
- Bellingham, Wash., USA : SPIE, c1996.
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Status Not available - Please for assistance. | FormatText | AccessUse in library | Call numberTA1505 .P762 vol.2723 | Item locationOff-site |
Details
- Additional authors
- Description
- vii, 412 p. : ill.; 28 cm.
- Series statement
- SPIE proceedings series ; v. 2723
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
- Subject
- Owning institution
- Princeton University Library
- Bibliography (note)
- Includes bibliographical references and index.