Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California /

Title
  1. Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Published by
  1. Bellingham, Wash., USA : SPIE, c1996.

Items in the library and off-site

Filter by

Displaying 1 item

StatusFormatAccessCall numberItem location
Status

Not available - Please for assistance.

FormatTextAccessUse in libraryCall numberTA1505 .P762 vol.2723Item locationOff-site

Details

Additional authors
  1. SEMATECH (Organization) http://id.loc.gov/authorities/names/nr91015579
  2. Seeger, David E.
  3. Semiconductor Equipment and Materials International. http://id.loc.gov/authorities/names/n90682619
  4. Society of Photo-optical Instrumentation Engineers. http://id.loc.gov/authorities/names/n78088934
Description
  1. vii, 412 p. : ill.; 28 cm.
Series statement
  1. SPIE proceedings series ; v. 2723
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.
Subject
  1. Ion beam lithography > Congresses
  2. Lithography, Electron beam > Congresses
  3. X-ray lithography > Congresses
  4. Integrated circuits > Masks > Congresses
Owning institution
  1. Princeton University Library
Bibliography (note)
  1. Includes bibliographical references and index.