Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California /

Title
  1. Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Published by
  1. Bellingham, Wash., USA : SPIE, c1997.

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Additional authors
  1. SEMATECH (Organization) http://id.loc.gov/authorities/names/nr91015579
  2. Seeger, David E.
  3. Semiconductor Equipment and Materials International. http://id.loc.gov/authorities/names/n90682619
  4. Society of Photo-optical Instrumentation Engineers. http://id.loc.gov/authorities/names/n78088934
Description
  1. ix, 412 p. : ill.; 28 cm.
Series statement
  1. SPIE proceedings series ; v. 3048
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 3048.
Subject
  1. Masks (Electronics) > Congresses
  2. X-ray lithography > Congresses
  3. Lithography, Electron beam > Congresses
Owning institution
  1. Princeton University Library
Bibliography (note)
  1. Includes bibliographical references and index.