Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California /

Title
  1. Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California / Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Published by
  1. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.

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Details

Additional authors
  1. International Society for Hybrid Microelectronics. http://id.loc.gov/authorities/names/n50037241
  2. Thompson, L. F., 1944-
Description
  1. vi, 350 p. : ill.; 28 cm.
Series statement
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 539
Subject
  1. Lithography, Electron beam > Congresses
  2. Integrated circuits > Masks > Congresses
  3. Photoresists > Congresses
Owning institution
  1. Princeton University Library
Bibliography (note)
  1. Includes bibliographies and index.