Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California

Title
  1. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Published by
  1. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.

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Details

Additional authors
  1. Blais, Philip D.
  2. SPIE--the International Society for Optical Engineering
  3. International Society for Hybrid Microelectronics
Description
  1. vi, 219 p. : ill.; 28 cm.
Series statement
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 537
Alternative title
  1. Electron beam, X-ray, and ion beam techniques for submicrometer lithographies four.
Subject
  1. Lithography, Electron beam > Congresses
  2. X-ray lithography > Congresses
  3. Ion beam lithography > Congresses
Owning institution
  1. Princeton University Library
Bibliography (note)
  1. Includes bibliographies and index.