Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California /

Title
  1. Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1990.

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Details

Additional authors
  1. Resnick, Douglas J.
  2. Society of Photo-optical Instrumentation Engineers. http://id.loc.gov/authorities/names/n78088934
Description
  1. viii, 344 p. : ill.; 28 cm.
Series statement
  1. Proceedings / SPIE--the International Society for Optical Engineering v. 1263
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
Alternative title
  1. Submicrometer lithographies nine.
Subject
  1. Lithography, Electron beam > Congresses
  2. Ion beam lithography > Congresses
  3. X-ray lithography > Congresses
Owning institution
  1. Princeton University Library
Note
  1. Includes index.
Bibliography (note)
  1. Includes bibliographical references.