Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California /
- Title
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
- Published by
- Bellingham, Wash., USA : SPIE, c1991.
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Status Not available - Please for assistance. | FormatText | AccessUse in library | Call numberTK7874 .E4357 | Item locationOff-site |
Status Not available - Please for assistance. | FormatText | AccessUse in library | Call number | Item locationOff-site |
Details
- Additional authors
- Description
- x, 340 p. : ill.; 28 cm.
- Series statement
- SPIE proceedings series, 0277-786X ; vol. 1465
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1465.
- Subject
- Owning institution
- Princeton University Library
- Note
- "Conference 1465 ... was part of a two-conference program on Lithography Engineering, held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii.
- Bibliography (note)
- Includes bibliographical references and index.