Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California /

Title
  1. Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.

Items in the library and off-site

Filter by

Displaying 1 item

StatusFormatAccessCall numberItem location
Status

Not available - Please for assistance.

FormatTextAccessUse in libraryCall numberTK7874.E4359 1993Item locationOff-site

Details

Additional authors
  1. Patterson, David O.
  2. Society of Photo-optical Instrumentation Engineers. (uri)http://id.loc.gov/authorities/names/n78088934
Description
  1. vii, 470 p. : ill.; 28 cm.
Series statement
  1. SPIE proceedings series, 0277-786X ; vol. 1924
Subject
  1. X-ray lithography > Congresses
  2. Lithography, Electron beam > Congresses
  3. Ion beam lithography > Congresses
Owning institution
  1. Princeton University Library