Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California /
- Title
- Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
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Status Not available - Please for assistance. | FormatText | AccessUse in library | Call numberTK7874.E436 1994 | Item locationOff-site |
Details
- Additional authors
- Description
- ix, 420 p. : ill.; 28 cm.
- Series statement
- SPIE proceedings series, 0277-786X ; vol. 2194
- Subject
- Owning institution
- Princeton University Library