Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California /
- Title
- Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
- Published by
- Bellingham, Wash., USA : SPIE, c1995.
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Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status Not available - Please for assistance. | FormatText | AccessUse in library | Call numberTK7874 .E437 1995 | Item locationOff-site |
Details
- Additional authors
- Description
- vii, 450 p. : ill.; 28 cm.
- Series statement
- SPIE proceedings series, 0277-786X ; vol. 2437
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 2437.
- Subject
- Owning institution
- Princeton University Library
- Bibliography (note)
- Includes bibliographical references and index.