Photoresist : materials and processes
- Title
- Photoresist : materials and processes / W.S. DeForest.
- Published by
- New York : McGraw-Hill, [1975]
- Author
Items in the library and off-site
Displaying 1 item
Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessUse in library | Call numberTK7874 .D42 | Item locationOff-site |
Details
- Description
- xi, 269 pages : illustrations; 24 cm
- Subject
- Owning institution
- Princeton University Library
- Bibliography (note)
- Includes bibliographical references and index.