Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California
- Title
- Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
- Published by
- Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
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Status | Format | Access | Call number | Item location |
---|---|---|---|---|
Status | FormatText | AccessUse in library | Call numberTK7874 .E433 | Item locationOff-site |
Details
- Additional authors
- Description
- vi, 219 p. : ill.; 28 cm.
- Series statement
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 537
- Alternative title
- Electron beam, X-ray, and ion beam techniques for submicrometer lithographies four.
- Subject
- Owning institution
- Princeton University Library
- Bibliography (note)
- Includes bibliographies and index.