Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

Title
  1. Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Published by
  1. Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.

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Details

Additional authors
  1. Resnick, Douglas J.
  2. Society of Photo-Optical Instrumentation Engineers.
Description
  1. viii, 344 p. : ill.; 28 cm.
Series statement
  1. SPIE proceedings series ; v. 1263
Uniform title
  1. Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
Alternative title
  1. Electron-beam, X-ray, and ion-beam technology IX
  2. Electron-beam, X-ray, and ion-beam submicrometer lithographies IX
  3. Submicrometer lithographies IX
  4. Electron-beam, X-ray, and ion-beam techniques for submicron lithographies.
  5. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies.
  6. Electron-beam, x-ray, and ion-beam lithographies.
Subject
  1. Microlithography > Congresses
  2. Masks (Electronics) > Congresses
  3. Lithography, Electron beam > Congresses
  4. X-ray lithography > Congresses
  5. Ion beam lithography > Congresses
  6. Ion beam lithography
  7. Lithography, Electron beam
  8. Masks (Electronics)
  9. Microlithography
  10. X-ray lithography
  11. Kongress
  12. Lithographie (Halbleitertechnologie)
Genre/Form
  1. Conference papers and proceedings.
  2. San Jose (Calif., 1990)
Contents
  1. Ion-beam lithography -- X-ray lithography -- Electron-beam lithography -- Electron-beam and x-ray resist technology -- Poster session: Beam lithography -- Additional paper: Advanced chemically amplified resist / H. Takahashi [and others].
Owning institution
  1. Princeton University Library
Note
  1. Includes index.
Bibliography (note)
  1. Includes bibliographical references.