Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California
- Title
- Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
- Published by
- Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
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---|---|---|---|---|
Status | FormatText | AccessUse in library | Call numberTK7874 .E4356 | Item locationOff-site |
Details
- Additional authors
- Description
- viii, 344 p. : ill.; 28 cm.
- Series statement
- SPIE proceedings series ; v. 1263
- Uniform title
- Proceedings of SPIE--the International Society for Optical Engineering ; v. 1263.
- Alternative title
- Electron-beam, X-ray, and ion-beam technology IX
- Electron-beam, X-ray, and ion-beam submicrometer lithographies IX
- Submicrometer lithographies IX
- Electron-beam, X-ray, and ion-beam techniques for submicron lithographies.
- Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies.
- Electron-beam, x-ray, and ion-beam lithographies.
- Subject
- Microlithography > Congresses
- Masks (Electronics) > Congresses
- Lithography, Electron beam > Congresses
- X-ray lithography > Congresses
- Ion beam lithography > Congresses
- Ion beam lithography
- Lithography, Electron beam
- Masks (Electronics)
- Microlithography
- X-ray lithography
- Kongress
- Lithographie (Halbleitertechnologie)
- Genre/Form
- Conference papers and proceedings.
- San Jose (Calif., 1990)
- Contents
- Ion-beam lithography -- X-ray lithography -- Electron-beam lithography -- Electron-beam and x-ray resist technology -- Poster session: Beam lithography -- Additional paper: Advanced chemically amplified resist / H. Takahashi [and others].
- Owning institution
- Princeton University Library
- Note
- Includes index.
- Bibliography (note)
- Includes bibliographical references.