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Proceedings. Edited by F. A. Glaski.
Text
[Hinsdale, Ill., American Nuclear Society, 1972]
1972
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 73-106 | Item locationOffsite |
Chemical vapor deposition; [papers]. Edited by Gene F. Wakefield [and] John M. Blocher, Jr.
Text
Princeton, N.J., Electrothermics and Metallurgy Division, Electrochemical Society [1973]
1973
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSD 74-981 | Item locationOffsite |
Vapor deposition; prepared by the editors of Chemical engineering progress.
Text
New York, 1966.
1966
0 resources
Proceedings of the Conference on Chemical Vapor Deposition, fifth international conference, 1975 / edited by John M. Blocher, Jr., Hans E. Hintermann, Lou H. Hall.
Text
Princeton, N.J. : Electrothermics and Metallurgy Division, Electrochemical Society, c1975.
1975
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSD 76-630 | Item locationOffsite |
Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977 / edited by Lee F. Donaghey, P. Rai-Choudhury, Richard N. Tauber.
Text
Princeton, N.J. : Electrochemical Society, c1977.
1977
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSD 78-384 | Item locationOffsite |
Proceedings of the Seventh International Conference on Chemical Vapor Deposition, 1979 / edited by Thomas O. Sedgwick, Hans Lydtin.
Text
Princeton, N.J. : Electrochemical Society, c1979.
1979
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 80-836 | Item locationOffsite |
Chemical vapor deposition, 1960-1980 : a bibliography / edited by Donald T. Hawkins.
Text
New York : IFI Plenum, c1981.
1981
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 82-17 | Item locationOffsite |
Chemical vapor deposition : proceedings of the Eighth International Conference on Chemical Vapor Deposition, 1981 / edited by John M. Blocher, Guy E. Vuillard, [and] Georg Wahl.
Text
Pennington, N.J. : Electrochemical Society, c1981.
1981
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSD 84-317 | Item locationOffsite |
Annual technical conference proceedings / Society of Vacuum Coaters.
Text
Washington, D.C. : The Society
198-1981
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSP 84-189 v. 24 (1981) | Item locationOffsite |
Proceedings of the Third European Conference on Chemical Vapor Deposition, 1980, April 16-18, Neuchatel, Switzerland / edited by H.E Hintermann.
Text
Neuchâtel, Switzerland : Laboratoire suisse de recherches horlogères, 1980.
1980
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSD 86-240 | Item locationOffsite |
Applications of plasma processes to VLSI technology / edited by Takuo Sugano ; translated by Hyo-gun Kim.
Text
New York : John Wiley & Sons, c1985.
1985
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 86-2282 | Item locationOffsite |
Beam-induced chemical processes : proceedings of Symposium D, 1985 Fall Meeting of the Materials Research Society, December 2-6, 1985, Boston Marriott Hotel at Copley Place, Boston, Massachusetts : extended abstracts / edited by R.J. von Gutfield, J.E. Greene, H. Schlossberg ; principal symposium support, Air Force Office of Scientific Research ; supplemental support, IBM Corporation.
Text
Pittsburgh : Materials Research Society, c1985.
1985
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 88-2478 | Item locationOffsite |
Proceedings of the Tenth International Conference on Chemical Vapor Deposition, 1987 / edited by G.W. Cullen ; consulting editor, J.M. Blocher, Jr. ; subject editors, D. Allred ... [et al.].
Text
Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Electrochemical Society, c1987.
1987
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 88-3240 | Item locationOffsite |
Proceedings of the ... annual technical conference / Society of Vacuum Coaters.
Text
[Washington, D.C.] : The Society, c1982-
1982-present
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSP 88-309 1983 | Item locationOffsite |
Thin films by chemical vapour deposition / C.E. Morosanu.
Text
Amsterdam ; New York : Elsevier ; Bucharest, Romania : Editura Tehnică, 1990.
1990
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 90-1859 | Item locationOffsite |
Rapid thermal annealing/chemical vapor deposition and integrated processing / symposium held April 25-28, 1989, San Diego, California, U.S.A. / editors, David Hodul ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1989.
1989
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 91-498 | Item locationOffsite |
Chemical vapor deposition of refractory metals and ceramics : symposium held November 29-December 1, 1989, Boston, Massachusetts, U.S.A. / editors, Theodore M. Besmann, Bernard M. Gallois.
Text
Pittsburgh, Pa. : Materials Research Society, c1990.
1990
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 91-2131 | Item locationOffsite |
Photochemical vapor deposition / J.G. Eden.
Text
New York : Wiley, c1992.
1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 92-1927 | Item locationOffsite |
Rapid thermal and integrated processing : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1991.
1991
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 92-1805 | Item locationOffsite |
Preparation of thin films / Joy George.
Text
New York : M. Dekker, c1992.
1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 93-428 | Item locationOffsite |
Chemical vapor deposition of refractory metals and ceramics II : symposium held December 4-6, 1991, Boston, Massachusetts, U.S.A. / editors, Theodore M. Besmann, Bernard M. Gallois, James W. Warren.
Text
Pittsburgh, Pa. : Materials Research Society, c1992.
1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 93-741 | Item locationOffsite |
Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A. / editors, Avishay Katz ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1992.
1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 93-1360 | Item locationOffsite |
Journal of chemical vapor deposition.
Text
Lancaster, PA : Technomic Pub., 1992-
1992-present
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSL 93-28 v. 3 | Item locationOffsite |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSL 93-28 v. 1-2 (1992-1994) | Item locationOffsite |
Rapid thermal and integrated processing II : symposium held April 12-15, 1993, San Francisco, California, U.S.A. / editors, Jeffrey C. Gelpey ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1993.
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 94-645 | Item locationOffsite |
Metal-organic chemical vapor deposition of electronic ceramics : symposium held on November 29-December 3, 1993, at Boston, Massachusetts, U.S.A. / editors, Seshu B. Desu ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1994.
1994
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 95-868 | Item locationOffsite |
Evolution of surface and thin film microstructure : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A. / editors, Harry A. Atwater ... [et al.].
Text
Pittsburgh, Pa. : Materials Research Society, c1993.
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 94-1476 | Item locationOffsite |
Thin-film deposition : principles and practice / Donald L. Smith.
Text
New York : McGraw-Hill, c1995.
1995
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 95-1179 | Item locationOffsite |
Materials and processes for surface and interface engineering / edited by Yves Pauleau.
Text
Dordrecht ; Boston : Kluwer Academic Publishers, 1995.
1995
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 95-1173 | Item locationOffsite |
Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A. / editors, Bernard M. Gallois, Woo Y. Lee, Michael A. Pickering.
Text
Pittsburgh, Pa. : Materials Research Society, c1995.
1995
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 95-1371 | Item locationOffsite |
High vacuum production in the microelectronics industry / Pierre Duval.
Text
Amsterdam ; New York : Elsevier, 1988.
1988
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 96-576 | Item locationOffsite |
Ergebnisse der Hochvakuumtechnik und der Physik dünner Schichten. Mit einem Geleitwort von W. Gerlach und Beiträgen von H. Adam [et al.].
Text
Stuttgart, Wissenschaftliche Verlagsgesellschaft, 1957.
1957
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberPCN (Auwarter, M. Ergebnisse der Hochvakuumtechnik) (1957) | Item locationOffsite |
Vacuum deposition of thin films / L. Holland ; with a foreword by S. Tolansky.
Text
New York, Wiley, 1958, c1956.
1958-1956
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberVID (Holland, L. Vacuum deposition of thin films) | Item locationOffsite |
Vapor deposition, edited by Carroll F. Powell, Joseph H. Oxley [and] John M. Blocher, Jr. Sponsored by the Electrochemical Society, New York.
Text
New York, Wiley [1966]
1966-
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberVID (Powell, C. F. Vapor deposition) | Item locationOffsite |
Vapor-plating: the formation of coatings by vapor-deposition techniques, by C. F. Powell, I. E. Campbell, and B. W. Gonser [of] Battelle Memorial Institute.
Text
New York, Wiley, c1955.
1955
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberVID (Powell, C. F. Vapor-plating) | Item locationOffsite |
Proceedings. Edited by A.C. Schaffhauser.
Text
[Hinsdale, Ill., American Nuclear Society] 1967.
1967
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberVID (Conference on Chemical Vapor Deposition of Refractory Metals, Alloys, and Compounds, Gatlinburg, Tenn., 1967. Proceedings) | Item locationOffsite |
Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control / by Donald M. Mattox.
Text
Westwood, N.J. : Noyes Publications, c1998.
1998
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 98-1335 | Item locationOffsite |
Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A. / editors, Mehmet C. Öztürk ... [et al.].
Text
Warrendale, Pennsylvania: Materials Research Society, c1998.
1998
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 99-1309 | Item locationOffsite |
Physical vapor deposition of thin films / John E. Mahan.
Text
New York ; Chichester [England] : Wiley, c2000.
2000
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 00-564 | Item locationOffsite |
Handbook of chemical vapor depos[i]tion (CVD) : principles, technology, and applications / by Hugh O. Pierson.
Text
Norwich, N.Y : Noyes Publications/William Andrew Pub., c1999.
1999
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSE 00-1032 | Item locationOffsite |
Convection and chemistry effects in CVD, a 3-D analysis for silicon deposition [microform] / S.A. Gokoglu ... [et al.].
Text
[Washington, DC] : National Aeronautics and Space Administration ; [Springfield, Va. : For sale by the National Technical Information Service, 1989]
1989-1989
0 resources
Vapor phase deposition studies of phosphate esters on metal and ceramic surfaces [microform] / Douglas E. Deckman and Stephen M. Hsu, E. Erwin Klaus.
Text
Gaithersburg, MD : U.S. Dept. of Commerce, National Institute of Standards and Technology, [1988]
1991-1988
0 resources
Vacuum vapor deposition [microform] : a spinoff of space welding development / by R.M. Pooman.
Text
[Marshall Space Flight Center, Ala.] : National Aeronautics and Space Administration, George C. Marshall Space Flight Center ; [Springfield, VA : For sale by the National Technical Information Service, 1991]
1991
0 resources
Research on chemical vapor deposition processes for advanced ceramic coatings [microform] / principal investigator: Daniel E. Rosner.
Text
New Haven, CT : Yale University, Dept. of Chemical Engineering, High Temperature Chemical Reaction Engineering Laboratory ; [Washington, DC : National Aeronautics and Space Administration ; Springfield, Va. : National Technical Information Service, distributor, 1993]
1993
0 resources
Synthesis of high performance ceramic fibers by chemical vapor deposition for advanced metallics reinforcing [microform] / Vithal Revankar and Vladimir Hlavacek.
Text
Buffalo, N.Y. : Laboratory for Ceramic and Reaction Engineering, Dept. of Chemical Engineering, State University of New York at Buffalo ; Cleveland, OH : NASA Lewis Research Center, [1991]
1991
0 resources
Synthesis of multifilament silicon carbide fibers by chemical vapor deposition [microform] : final technical report ... / Vithal Revankar and Vladimir Hlavacek.
Text
Buffalo, N.Y. : Laboratory for Ceramic and Reaction Engineering, Dept. of Chemical Engineering, State University of New York at Buffalo ; Cleveland, OH : NASA Lewis Research Center, [1991]
1991
0 resources
Chemical vapor deposition / edited by Jong-Hee Park, T.S. Sudarshan.
Text
Materials Park, OH : ASM International, 2001.
2001
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 01-960 | Item locationOffsite |
Buoyancy-driven heat transfer during application of a thermal gradient for the study of vapor deposition at low pressure using an ideal gas [microform] / D.O. Frazier ... [et al.].
Text
[Washington, D.C. : National Aeronautics and Space Administration, 1997]
1997-1997
0 resources
Fabrication of lightweight Si/SiC LIDAR mirrors [microform] / Jitendra S. Goela and Raymond L. Taylor.
Text
[Washington, D.C.] : National Aeronautics and Space Administration, Office of Management, Scientific and Technical Information Program ; [Springfield, Va. : For sale by the National Technical Information Service], 1991.
1991
1 resource
Available online
http://purl.access.gpo.gov/GPO/LPS67721Experimental verification of corrosive vapor deposition rate theory in high veloicty burner rigs [microform] / Suleyman A. Gokoglu and Gilbert J. Santoro.
Text
[Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, 1986]
1986
0 resources
Criteria for significance of simultaneous presence of both condensible vapors and aerosol particles on mass transfer (deposition) rates [microform] / Suleyman A. Gokoglu.
Text
[Cleveland, Ohio : National Aeronautics and Space Administration, Lewis Research Center, 1986]
1986
0 resources
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