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SEMICON/West, May 20-22, 1986, San Mateo, California : process and equipment reliability in the fab environment / presented by Semiconductor Equipment and Materials Institute, Inc.
Text
Mountain View, Calif. : The Institute, [1986?]
1986
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 88-563 | Item locationOffsite |
The physics of submicron lithography / Kamil A. Valiev.
Text
New York : Plenum Press, c1992.
1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 92-934 | Item locationOffsite |
Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Text
New York : J. Wiley, 1993.
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberJSF 95-175 | Item locationOffsite |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE, [1991], ©1991.
1991-1991
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4357 1991g | Item locationOff-site |
The physics of submicron lithography / Kamil A. Valiev.
Text
New York : Plenum Press, [1992], ©1992.
1992-1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .V336 1992 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California / Martin Peckerar,chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE, [1992], ©1992.
1992-1992
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4818 1992g | Item locationOff-site |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash. : The Society, [1993], ©1993.
1993-1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4863 1992g | Item locationOff-site |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Text
Bellingham, Wash., USA : SPIE, [1994], ©1994.
1994-1994
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4834 1994g | Item locationOff-site |
Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Text
New York : J. Wiley, 1993.
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7872.M3 P38 1993 | Item locationOff-site |
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Text
Bellingham, Wash., USA : SPIE, [1995], ©1995.
1995-1995
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E44 1995g | Item locationOff-site |
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash. : SPIE, [1996], ©1996.
1996-1996
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E44 1996g | Item locationOff-site |
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International [and] SEMATECH.
Text
Bellingham, Wash., USA : SPIE, [1997], ©1997.
1997-1997
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E64 1997g | Item locationOff-site |
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash. : SPIE, [1998], ©1998.
1998-1998
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 1998g | Item locationOff-site |
Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California / Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.
Text
Bellingham, Washington : SPIE, [1999], ©1999.
1999-1999
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 1999g p.1 | Item locationOff-site |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 1999g p.2 | Item locationOff-site |
EUV, X-ray, and neutron optics and sources : 21-23 July 1999, Denver, Colorado / Carolyn A. MacDonald [and others], chairs/editors ; sponsored ... by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE, [1999], ©1999.
1999-1999
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTA1775 .E98 1999g | Item locationOff-site |
Emerging lithographic technologies IV : 28 February-1 March, 2000, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Text
Bellingham, Washington : SPIE, [2000], ©2000.
2000-2000
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2000g | Item locationOff-site |
Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA / Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Text
Bellingham, Washington : SPIE, [2001], ©2001.
2001-2001
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2001g | Item locationOff-site |
Emerging lithographic technologies VI : 5-7 March, 2002, Santa Clara, [California], USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Text
Bellingham, Washington : SPIE, [2002], ©2002.
2002-2002
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2002g v.1 | Item locationOff-site |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2002g v.2 | Item locationOff-site |
Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
Text
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
1986
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E43 | Item locationOff-site |
Emerging lithographic technologies VII : 25-27 February, 2003, Santa Clara, California, USA / Roxann L. Engelstad, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.
Text
2003
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2003g pt.1 | Item locationOff-site |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2003g pt.2 | Item locationOff-site |
Emerging lithographic technologies VIII : 24-26 February, 2004, Santa Clara, California, USA / R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.
Text
Bellingham, Wash., USA : SPIE, c2004.
2004
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2004g pt.1 | Item locationOff-site |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E523 2004g pt.2 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
1987
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4775 1987g | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VII : 2-4 March 1988, Santa Clara, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : The Society, [1988], ©1988.
1988-1988
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4826 1988 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : The Society, [1989], ©1989.
1989-1989
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4355 1989g | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, [1990], ©1990.
1990-1990
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4356 1990g | Item locationOff-site |
Technology of proximal probe lithography / Christie R.K. Marrian, editor.
Text
Bellingham, Wash. : SPIE Optical Engineering Press, c1993.
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.8 .T43 1993 | Item locationOff-site |
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash., USA : SPIE, c1996.
1996
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTA1505 .P762 vol.2723 | Item locationOff-site |
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash., USA : SPIE, c1997.
1997
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTA1505 .P762 vol.3048 | Item locationOff-site |
X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
Text
Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
1984
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.X73 | Item locationOff-site |
Advances in resist technology : March 12-13, 1984, Santa Clara, California / C. Grant Willson, chairman/editor.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.
1984
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK8331.A38 | Item locationOff-site |
Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California / Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
1985
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK8331 .A383 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Text
1985
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E433 | Item locationOff-site |
Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
Text
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
1986
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E434 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
Text
1987
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.E435 | Item locationOff-site |
Electron-beam technology in microelectronic fabrication / edited by George R. Brewer.
Text
New York : Academic Press, 1980.
1980
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E48 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Text
1989
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.E4355 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1990.
1990
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4356 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California / Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : SPIE, c1991.
1991
2 items
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4357 | Item locationOff-site |
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call number | Item locationOff-site |
Not available - Please for assistance.
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.
Text
1993
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.E4359 1993 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
Text
1994
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874.E436 1994 | Item locationOff-site |
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International.
Text
Bellingham, Wash., USA : SPIE, c1995.
1995
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E437 1995 | Item locationOff-site |
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash., USA : SPIE, c1996.
1996
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTA1505 .P762 vol.2723 | Item locationOff-site |
Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering : cooperating organization SEMI--Semiconductor Equipment and Materials International, SEMATECH.
Text
Bellingham, Wash., USA : SPIE, c1997.
1997
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTA1505 .P762 vol.3048 | Item locationOff-site |
X-ray lithography and applications of soft x-rays to technology : October 19-20, 1983, Upton, New York / Alan D. Wilson, chairman/editor ; cosponsors, National Synchrotron Light Source/Brookhaven National Laboratory, SPIE--The International Society for Optical Engineering.
Text
Bellingham, Wash. : SPIE--The International Society for Optical Engineering, c1984.
1984
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .X73 | Item locationOff-site |
Advances in resist technology : March 12-13, 1984, Santa Clara, California / C. Grant Willson, chairman/editor.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1984.
1984
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK8331 .A38 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California / Philip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, c1985.
1985
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E433 | Item locationOff-site |
Electron-beam, x-ray, & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California / Phillip D. Blais, chairman/editor.
Text
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, c1986.
1986
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E434 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam lithographies VI : 5-6 March 1987, Santa Clara, California / Phillip D. Blais, chair/editor.
Text
Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 1987.
1987
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E435 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE-the International Society for Optical Engineering.
Text
Bellingham, Wash., USA : The Society, c1989.
1989
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4355 | Item locationOff-site |
Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California / Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.
Text
Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1990.
1990
1 item
| Format | Call number | Item location |
|---|---|---|
| FormatText | Call numberTK7874 .E4356 | Item locationOff-site |
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